Enabling Resist Recess Depth Recipe Transfer and Fab-to-Fab MatchingTue Jun 20 2023
- Title: AFM Surface Roughness and Depth Measurement of Trenches with High Aspect Ratio
- Authors: Franz Heider, Helfried Schwarzfurtner, Mario Lugger, Sang-Joon Cho, Thomas Trenkler
- Publication: Conference Proceedings: 30th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)
- Publisher: IEEE
- Date: May 2019
https://www.nanotools.com/blog/enabling-resist-recess-depth-recipe-transfer-and-fab-to-fab-matching.html